Wafer Metal Lift-Off Solutions
Metal Lift-Off Advantages
Features and Benefits:
- Reduce DamageImprove Lift-Off performance
- No metal redeposition — front & back sideFewer suspended particles
- Eliminate feature erosion and scratches
- 80% Reduction in Chemical Use
- Lower cost of ownership
- Batch immersion eliminates spray control issues
- Increase Reclaim
- 99% precious metal capture with integrated filters and screens
- Accessible and removable screens provide rapid cleanouts
- 50% Smaller Footprint
- Efficient fab utilization
- Easy installation and facilities hook up
- Higher Reliability
- Low PM requirements — no spray nozzle changes
- Reduced scrap
- No complex wafer handling
- 100 WPH Throughput
- High uptime
- No daily shutdown for maintenance
- Metal Lift-off Chemistries Supported
- Acetone and IPA
- EKC Solvent blends
- NMPIntelligent Fluids “LisoPure”
- Metal Lift-off – The FluidJet™ Process Tank
- Provides metal removal utilizing precise hydraulic forces with robot agitation to maximize coverage
- Oscillating fluid forces to optimize metal removal from cassette
- Tank fluid flow is balanced to maximize metal removal and achieve maximum metal cleanout
- Fluid flow modeled to specific field proven velocity requirements for stripping metal
- All designs are computer tested before manufacture
Contact our Experts
We are happy to help our customers find efficient and process-optimized solutions for their wet processing applications.