Wafer drying removes remaining watermarks and rinsing off any residues from previous process steps. RENA offers a broad spectrum of integrated and standalone wafer drying stations. We supply customers with a family of COMPASS spin rinse dryers (SRDs), patented Genesis Marangoni dryer and VaporDry. Our drying platforms are designed to be cost efficient while meeting customers particle performance specifications. All platforms are assisted by the IDX Flexware process control software which facilitates advanced process control and monitoring.
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We are happy to help our customers find efficient and process-optimized solutions for their wet processing applications.