RENA's Critical Etch solutions with TruEtch Processing Technology (Patent Protected in USA, Europe, and Asia Patent No. 9,562,291).
Through superior Wet bench immersion systems designed to utilize integrated wafer rotation and precise micro bubble agitation for superior wetting and uniform etching of noble metal layer patterns for Si, Si02, and III-V materials. With TruEtch RENA offers critical etching solutions with advanced hardware, complete process understanding & precise software execution for pattern metal etching.
RENA's proprietary IDX Flexware Process Control software provides complete control of all critical processes and conditions through closed-loop monitoring and feedback. IDX Flexware provides advanced capabilities, features, and options that are required for advanced process applications and solutions.
RENA's Flexview software enables equipment and process engineers to review the processing conditions of a specific lot ID at a glance. FlexView software does this by providing a graphic representation of all existing monitored conditions & tolerances, then storing that data in a file that is specific to the Lot ID that was being processed at that time. In the event of a yield loss on a particular lot, the process engineer can quickly identify if the wet station processed that lot within the required specifications. In this way, the system can be much more easily eliminated as a possible cause of the yield loss even. FlexView eliminates the need to interpret large amounts of data in the data log. This creates the opportunity for greater system optimization and process transparency while improving the overall operator experience.
