Genesis Stand-Alone Marangoni Dryer

Wafer Drying Utilizing Advanced Hardware, Process Understanding & Software Execution

Wafer drying is completed while minimizing contact to production wafers. The Genesis utilizes a proprietary design to ensure the face of the wafer is not contacting the Teflon cassette during the dry cycle. 

MARANGONI DRYING FEATURES:

Improve Yield, Reduce Particles MEI’s integrated Marangoni Dryer provides superior performance by utilizing:

• Manually loaded cassettes or optional automated wafer handling with robot
• Teflon cassettes
• Substrates are free of watermarks after drying
• Enables chemical cleaning before drying with no air interface
• Will not damage sensitive photo resist layers during dry
• Typical cycle times 7-20 minutes
• Dries phobic or philic surfaces
• Host compatible
• Optional chemical injection
• IPA usage 20ml per dry cycle
• Wafer size solutions for 50mm - 200m
• CE marked

Robust, Efficient, Clean & Cost Effective

VARYING DRYER DESIGNS MATCH VARYING NEEDS

• Integrated DI water filtration option

• Optional IPA recirculation for more robust particle performance

• Low cost of ownership

Genesis Theory of Operation - Marangoni Effect

Drying based on surface tension gradient forces is an ultra-clean drying process. In this technique a volatile organic compound with lower surface tension than water is introduced in the vicinity of a substrate in the form of vapor as the wafer or the water is slowly withdrawn.

As the small quantity of alcohol vapor comes into contact with the continuously refreshed water meniscus, it absorbs in the water creating a surface tension gradient. The gradient causes the meniscus to partially contract and assume an apparent finite angle via a flow.

This causes the thin water film to flow off the substrate leaving it dry. This flow also removes nonvolatile contaminants and entrained particles.

RENA Integrated Dryer Solutions Providing Superior Performance