Specialized Wafer Etching Solutions

TruEtch Technology is the perfect solution for InGaP Etch, GaAs Etch, and InGaAs Etch Solutions

RENA NA strives to be your partner in creating wet processing solutions. We have knowledgeable staff working on application-specific semiconductor processing solutions, including Metal Liftoff, Semiconductor Etch, Resist strip, Advanced Wet Etch, Gold Etch and more. We are more than just Wet Benches. Contact us today for more information for your next Wet Processing solution.


Consistent Etch Performance Features

  • Stable Concentration Control and Monitoring
  • High-Resolution Chemical DI Injection
  • Consistent, Change out to Change out,
  • No Residue Left Behind
  • Improved Consistent Etch Rates
  • Stabilized Flow Rates
  • Etch Rate Uniformity (150mm)
  • No Contamination
  • Improved Etch Stability

Benefits

  • DI Water Flow Controllers prevent variances to facility pressure fluctuations during chemical spiking
  • Independent Water Loss Sensing allows IDX to monitor and respond to low volume levels providing the best etch rate stability possible
  • Higher Up-time > 95%
  • Reduced scrap
  • Precise, reliable wafer transfer
  • Programmable Chemical Spiking Control
  • Lengthened Tank Life, Increased Up-time, Lower Cost
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